Transparent ZnO Thin Films grown by RF Magnetron Sputtering for Opto-Electronic Applications

Abstract

Zinc Oxide (ZnO) thin films are deposited by Radio Frequency (RF) Magnetron Sputtering method at three RF powers of 120W, 140W and 160W. The polycrystalline nature of the films are conformed from X-ray diffraction analysis. The optical bandgaps of the films are 3.2, 3.18 and 3.16 eV respectively. Films also shows very good transparency of more than 80% wavelength more than 480nms. The transparency in visible range of spectrum and low temperature deposition of ZnO thin films makes them appropriate for devices such as Thin Film Transistors, Sensors, and Light Emitting Diodes etc.