Emir Analysis

Abstract

Electro migration [1] is largely considered to be the result of momentum transfer from the electrons, which move in the applied electric field, to the ions which make up the lattice of the interconnect material. The consequence is significant in applications where high direct current densities are used, such as in microelectronics and related structures. As the structure size in electronics such as integrated circuits (ICs) decreases, the practical significance of this effect increases. In this paper we reduce the EMIR analysis time on complex, large designs by improving algorithm without compromising on accuracy. Modularizing the software to enable reuse of previously generated data during multiple runs. Improving the memory utilization for complex designs.